Photomask division
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- Photomask division
- Detailed specification
We always employ the latest equipment, from CAD to drawing to testing, to flexibly meet our customers' varied needs.
Detailed specification
Product specs
Chrome mask, Reticle
- Feature
-
- High light shielding ability, Sharp pattern edge
- Thin chromium film and resist,The finest pattern resolution
- Good durability
- Less changes in dimensional
Copy mask (Cr)
- Feature
-
- Reasonable
- Short delivery time
- Good mass productivity
Emulsion mask (Er)
- Feature
-
- Higher resolution than film mask
- Reasonable than chrome mask
photomask soecification | Master hard mask (Cr) | Copy mask | Emulsion mask | |
---|---|---|---|---|
precision product | common product | |||
materials | Quartz / Soda-lime grass | SL | ||
size limitation (mm) | ~400x400 | ~700x800 | ~508x609.4 | ~711x813 |
minimum resolution (μm) | 1.0~ | 2.0~ | 3.0~ | 10.0~ |
line accuracy (μm) | ±0.1~ | ±0.2~ | ±1.0~ | ±3.0~ |
pitch accuracy (μm) | ±1.0~ | ±1.0~ | ±2.0~ | ±5.0~ |
*1. Numbers of precision product are quartz
*2. It depends on pattern shape and material
System of quality control
Photomasks are essential to create products employing leading technologies, such as semiconductors, electronic components and flat panel displays.
Using a variety of measuring and testing instruments to test our products, we work hard to ensure customers can depend on the quality of our photomasks.
Dimension mesurment machine
- measuring object
- Chrome mask, Reticle
- maximum size (mm)
- 800x800
- inspection item
- open, short, cosmetic defect, protrusion, intrusion, shift
- method of illumination
- epi-illumination, transmitted illumination
- detection method
- DIE to DIE, DRC, shift comparison, wafer comparison
Accessible format
FORMAT | Note |
---|---|
DWG, DXF | AutoCAD2007 correspondence |
GERBER | RS274X |
GDS++ | |
DMNDOS | Helix V5R2 |
SSF (START) |