Photomask division

We always employ the latest equipment, from CAD to drawing to testing, to flexibly meet our customers' varied needs.

Detailed specification

Product specs

Chrome mask, Reticle
Feature
  • High light shielding ability, Sharp pattern edge
  • Thin chromium film and resist,The finest pattern resolution
  • Good durability
  • Less changes in dimensional

Copy mask (Cr)
Feature
  • Reasonable
  • Short delivery time
  • Good mass productivity

Emulsion mask (Er)
Feature
  • Higher resolution than film mask
  • Reasonable than chrome mask

photomask soecification Master hard mask (Cr) Copy mask Emulsion mask
precision product common product
materials Quartz / Soda-lime grass SL
size limitation (mm) ~400x400 ~700x800 ~508x609.4 ~711x813
minimum resolution (μm) 1.0~ 2.0~ 3.0~ 10.0~
line accuracy (μm) ±0.1~ ±0.2~ ±1.0~ ±3.0~
pitch accuracy (μm) ±1.0~ ±1.0~ ±2.0~ ±5.0~

*1. Numbers of precision product are quartz
*2. It depends on pattern shape and material

System of quality control

Photomasks are essential to create products employing leading technologies, such as semiconductors, electronic components and flat panel displays.
Using a variety of measuring and testing instruments to test our products, we work hard to ensure customers can depend on the quality of our photomasks.

Dimension mesurment machine
measuring object
Chrome mask, Reticle
maximum size (mm)
800x800
inspection item
open, short, cosmetic defect, protrusion, intrusion, shift
method of illumination
epi-illumination, transmitted illumination
detection method
DIE to DIE, DRC, shift comparison, wafer comparison

Accessible format
FORMAT Note
DWG, DXF AutoCAD2007 correspondence
GERBER RS274X
GDS++  
DMNDOS Helix V5R2
SSF (START)